Skoltech is an international graduate research-focused university that was founded by the group of world-renowned scientists in 2011. Skoltech's curriculum focuses on technology and innovation, offering Master's programs in 11 technological disciplines. Students receive rigorous theoretical and practical training, design their own research projects, participate in internships and gain entrepreneurial skills in English. The faculty is comprised of current researchers with international accreditation and achievements.

Ultra low k dielectrics for ULSI Interconnects

Keywords

ULSI, interconnect, dielectric, low-k, nanocomposite

Applications

ULSI interconnects, interlayer dielectrics

Problem statement

The modern ULSI technology requires interconnects with less and less dielectric constant. Though modern dielectrics demonstrate k = 2.5 the materials with k < 2 are required by the industry

Technology

We developed a new ultra low-k dielectric material, which is a combination of inorganic nanoparticles with voids inside and the highly fluorinated polymers. This combination allowed us to obtain materials with the k (dielectric constant) < 2. The technology is spin-on and compatible with modern ULSI manufacture technology.  Also our material possesses mechanical and thermal durability and low copper diffusion rate as well as high values of breakdown voltage and low leakage current. If implemented, it will allow the next step in the miniaturization of ULSI and is intended for the 12 nm and less integration.

Advantages

  • Ultra low k
  • Easy deposition – spin on
  • Non-expensive materials
  • High mechanical and thermal stability
  • Low tan delta
  • Low copper diffusion rate

Inventors/Authors

Intellectual Property

  • PCT patent application: PCT/RU2013/001172

Publications

  1. Mukhamed Keshtov, Ernest Said-Galiev, Vitaliy Kochurov and Alexei Khokhlov / New polyimide-polyoxometalate nanocomposite materials with nanoporous structure and ultra-low dielectric constant, formed in supercritical carbon dioxide / AIP Conf. Proc. 1459, 277 (2012); http://dx.doi.org/10.1063/1.4738468
  2. Mukhamed KeshtovErnest Said-Galiev and Alexei Khokhlov / Development of new polymers with ultra-low dielectric constant using gaseous CO2 / AIP Conf. Proc. 1459 , 157 (2012) ; http://dx.doi.org/10.1063/1.4738429

 Back to Skoltech technologies list >>

If you are interested in this technology please contact the KTO staff to discuss licensing opprotunities or R&D collaboration